Experimental and Numerical Studies on $dV/dt$ Robustness of 1200 V High-Voltage Integrated Circuits Using Self-Isolation Structure
スポンサーリンク
概要
- 論文の詳細を見る
Experimental results on the high-voltage level shifter and $dV/dt$ robustness of 1200 V high voltage integrated circuits (HVICs) using a self-isolation (SI) structure are reported for the first time. Generally, because high $dV/dt$ stress is applied to HVICs during insulated gate bipolar transistor (IGBT) switching, significant displacement current flows through a high-voltage isolation capacitance. This current acts as the base current of parasitic pnp and npn transistors, and causes a potential drop in their base region. In the worst case, this parasitic operation causes device destruction. In this study, not only the normal operation of HVICs but suppression of the parasitic transistors under high $dV/dt$ condition are experimentally demonstrated by considering a high-side layout design and back diverter electrode.
- 2006-01-15
著者
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Seki Yasukazu
Fuji Electric Advanced Technology Co. Ltd.
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Kumagai Naoki
Fuji Electric Advanced Technology Co. Ltd.
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Nishiura Akira
Fuji Electric Device Technology Co. Ltd.
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Yamazaki Tomoyuki
Fuji Electric Device Technology Co. Ltd.
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Fujihira Tatsuhiko
Fuji Electric Device Technology Co. Ltd.
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Matsumoto Takashi
School Of Engineering University Of Yamanashi
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Nishiura Akira
Fuji Electric Device Technology Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390, Japan
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Jimbo Shin-ichi
Fuji Electric Advanced Technology Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390, Japan
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Seki Yasukazu
Fuji Hitachi Power Semiconductor Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390, Japan
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Kumagai Naoki
Fuji Electric Advanced Technology Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390, Japan
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Fujihira Tatsuhiko
Fuji Electric Device Technology Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390, Japan
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Yamazaki Tomoyuki
Fuji Hitachi Power Semiconductor Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390, Japan
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