Growth of CuPc Thin Films on Structured SiO2/Si(100) Studied by Metastable Electron Emission Microscopy and Photoelectron Emission Microscopy
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概要
- 論文の詳細を見る
A combined metastable electron emission microscopy (MEEM) and photoelectron emission microscopy (PEEM) study has been performed for copper phthalocyanine (CuPc) thin films vacuum deposited on Si(100) with a lithographic SiO2 pattern. The MEEM image of SiO2 pattern edges changed considerably upon deposition of a very small amount of CuPc on the SiO2/Si(100) substrate, whereas no such changes were observed in the PEEM images. The different contrast features in MEEM and PEEM can be the result of different surface sensitivities of these microscopy techniques. The MEEM contrast characteristic for the pattern edges after the CuPc deposition may be ascribed to the difference of the molecular orientation of CuPc which cannot be observed by PEEM.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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Miyauchi Jun
Department Of Clinical Laboratory National Center For Child Health And Development
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KERA Satoshi
Department of Materials Technology, Faculty of Engineering, Chiba University
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Shionoiri Masakazu
Department Of Materials Technology Faculty Of Engineering Chiba University
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Ueno Nobuo
Department Of Applied Physics Tohoku University
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ABDUREYM Abduaini
Department of Chemistry, Graduate School of Arts and Sciences, The University of Toky
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OKUDAIRA Kouji.
Department of Materials Technology, Faculty of Engineering, Chiba University
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Onoue Miki
Department Of Materials Technology Faculty Of Engineering Chiba University
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Ibe Takahiro
Department Of Materials Technology Faculty Of Engineering Chiba University
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Harada Yoshiya
Life Culture Department Seitoku University
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Okudaira Kouji.
Department of Materials Technology, Faculty of Engineering, Chiba University, Yayoi-cho, Inage-ku, Chiba 263-8522, Japan
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Ibe Takahiro
Department of Materials Technology, Faculty of Engineering, Chiba University, Yayoi-cho, Inage-ku, Chiba 263-8522, Japan
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