VUV-Assisted Etching of Silicon (100) and Poly(methyl methacrylate) : Semiconductors and Semiconductor Devices
スポンサーリンク
概要
- 論文の詳細を見る
The possibility of photoetching of silicon and poly(methyl methacrylate)(PMMA) has been studied using vacuum ultra violet(VUV) light under the existence of reactive species produced by 2.45 GHz discharge of CF_4/O_2(5%)gas. The VUV light was obtained by hydrogen gas discharge with a cpillary-type discharge lamp. For both materials, the chemical dry etching by the reactive species was clearly enhanced by VUV irradiation to the surface of the materials. the results suggest that the VUV-induced etching is the result of a surface photochemical reaction which is useful in producing anisotropic photoetching.
- 1988-09-20
著者
-
Ueno Nobuo
Department Of Applied Physics Tohoku University
-
Ueno Nobuo
Department Of Image Science And Technology Faculty Of Engineering Chiba University
-
TANAKA Kenichiro
Photon Factory, National Laboratory for High Energy Physics
-
Sugita Kazuyuki
Department Of Image Science And Technology Faculty Of Engineering Chiba University
-
Sugita Kazuyuki
Department Of Image Science And Engineering Chida University
-
MITSUHATA Tsuneo
Department of Image Science and Technology, Faculty of Engineering, Chiba University
-
Tanaka Kenichiro
Photon Factory National Laboratory For High Energy Physics
-
Sugita Kazuyuki
Department of Graphic Engineering, Faculty of Engineering, Chiba University
関連論文
- Antiferromagnetic Domain Structure Imaging of Cleaved NiO(100) Surface Using Nonmagnetic Linear Dichroism at O K Edge : Essential Effect of Antiferromagnetic Crystal Distortion(Condensed Matter : Electronic Structure, Electrical, Magnetic and Optical Prop
- Low-Energy Electron Transmission Spectroscopy of Thin Films of Chloroaluminum Phthalocyanine on MoS_2
- Photoemission from Coronene and Pentacene Polycrystals
- Intensity Dependence of He II Resonance Radiation on Helium Gas Pressure
- Photoelectron Spectroscopy of Perylene Polycrystal
- Photodegradable Toners for Electrophotography III. Accelerated Photodegradation and Suppressed Photocrosslinking of Matrix Resin-Their Dependence on Polymer Composition, UV-light Source, and Irradiation Conditions
- Conductance Switching Phenomena and H-Like Aggregates in Squarylium-Dye Langmuir-Blodgett Films : Surfaces, Interfaces, and Films
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep Ultraviolet Lithography:II. Limited Permeation of Si Compounds from Liquid Phase^* : Instrumentation, Measurement, and Fabrication Technology
- Photodegradable Toners for Electrophotography II. Accelerated Photodegradation of Matrix Resin by Deep Ultraviolet-Exposure at an Elevated Temperature
- Enhancement of Dry-Etching Durabilities by Energy or Etchant Quenching with Aliphatic, Aromatic and Alicyclic Homopolymers, Polymer Blends and Copolymers
- Energy Quenching Effects on Dry-Etching Durability of Copolymers and Polymer Blends of Vinylnaphthalene or a-Methyl Styrene with Methyl Methacrylate
- Large Electric Conductance in the Interface Direction of Polar/Nonpolar Double-Layered Hetero-Langmuir-Blodgett Films
- Photodegradable Toners for Electrophotography I. Photodegradability of Matrix Resin
- In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces
- Growth and Stability of H_2-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- Growth of Pb-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- Photochemical Etching of GaAs using Synchrotron Radiation
- Radiation Effect in Hexatriacontane Thin Film
- Mass Spectroscopy of Vaporized (SN)_x Polymer
- Nuclear Magnetic Resonaneces of Gd^, Gd^ and Co^ in Cd_2Co_7
- Thickness Dependence of Itching Rate in Dry Photoetching of Organic Resists
- High-speed recovery of germanium in a convection-aided mode using functional porous hollow-fiber membranes
- Low-Energy Electron Scattering from Solution-Cast Polyethlene
- Electron Affinities of Polystyrene and Poly(2-vinylpyridine) by Low-Energy Electron Inelastie Scattering
- Experimental Study of Conduction Band Structure of Some n-Alkanes and Polyethylene by Means of Low Energy Electron Scattering and Photoelectron Spectroscopy
- Dry-Etching Durability of Copolymers and Polymer Blends of Vinylnaphthalene or α-Methylstyrene with Methyl Methacrylate
- VUV-Assisted Etching of Silicon (100) and Poly(methyl methacrylate) : Semiconductors and Semiconductor Devices
- Direct Etching of Resists by UV Light
- Growth of CuPc Thin Films on Structured SiO2/Si(100) Studied by Metastable Electron Emission Microscopy and Photoelectron Emission Microscopy
- Organic Bistable Memory Switching Phenomena in Squarylium-Dye Langmuir-Blodgett Films
- Energy Quenching Effects on Dry-Etching Durability of Alicyclic-Aliphatic Copolymers and Polymer Blends Enhanced by Polymer-Chain Entanglement
- Evidence of Anisotropic Diffusion of Indium Atoms on a Surface of Perylene-3,4,9,10-tetracarboxilic dianhydride/MoS2 System Observed by Photoelectron Emission Microscopy (PEEM)
- Photosensitive Ionomer. IV. Preparation of Mercurous Copoly(vinyl alcohol-methacrylate) and Properties of the Plate
- Ultraviolet photoelectron spectroscopy of some fundamental vinyl polymers and the evolution of their electronic structures.
- Photosensitive Ionomer. I. Preparation of Mercurous Acrylate and Photosensitive Plates