CO2-Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of Silicon Dioxide Thin Film

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概要

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• The plasma enhanced chemical vapor deposition (PECVD) of silicon dioxide (SiO2) thin films from SiH4 and N2O has been executed with and without CO2 laser illumination. The quality of the film processed under a 10.6 $\mu$m CO2 laser was close to that of a film grown when the substrate was heated to 200°C. Since the temperature of the film substrate under CO2 laser illumination was only about 55°C, this method should be helpful in processes where a low thermal budget is required. CO2-laser-assisted PECVD (termed LAPECVD) with a substrate heated to 200°C resulted in a SiO2 thin film with excellent $I$–$V$ characteristics and surface morphology, as well as a higher refractive index and lower etching rate in BOE solution. Application of this thin film should be explored.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2001-05-15

著者

• Lee Ching-ting

  Institute Of Electro-optical And Materials Science National Formosa University

• Liu Hai-pei

  Institute Of Optical Sciences National Central University

• TSAI Hung-Sheng

  Lee-Min Institute of Technology

• CHANG Sheng-Hsiung

  Department of Electrical Engineering, Far East College

• Chiu Hsin-ching

  Institute Of Optical Sciences National Central University

• Cheng Chao-chia

  Institute Of Optical Sciences National Central University

• Chang Sheng-Hsiung

  Department of Electrical Engineering, Far East College, Tainan, Taiwan, R.O.C.

• Liu Hai-Pei

  Institute of Optical Sciences, National Central University, Chung-Li, Taiwan, R.O.C.

• Tsai Hung-Sheng

  Lee-Min Institute of Technology, Taipei, Taiwan, R.O.C.

• Cheng Chao-Chia

  Institute of Optical Sciences, National Central University, Chung-Li, Taiwan, R.O.C.

• Chiu Hsin-Ching

  Institute of Optical Sciences, National Central University, Chung-Li, Taiwan, R.O.C.

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