Advanced Micro-Lithography Process with Chemical Shrink Technology
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概要
- 論文の詳細を見る
We have developed an advanced micro-lithographic process for producing 0.1 $\mu$m contact holes (CH). A chemical shrink technology, resolution enhancement lithography assisted by chemical shrink (RELACS) utilizes the cross-linking reaction catalyzed by the acid component existing in a predefined resist pattern. This "RELACS" process is a hole shrinking procedure that includes simple coating, baking, and rinse steps applied after conventional photolithography. We evaluated the dependency of CH shrinkage on resist formulation. Though the acetal type KrF positive resist (low activation energy system) can achieve around 0.1 $\mu$m CH after RELACS processing under the optimized condition, the acrylate type positive resist (high activation energy system) showed less shrinkage under the same process condition. The shrinkage performance of the RELACS process largely depends on the resist chemistry used as the underlying layer. The results of these studies are discussed in terms of the influence of the base polymer on shrinkage performance and tendency.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-01-15
著者
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Yasuda Naoki
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Co.
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TOYOSHIMA Toshiyuki
Advanced Tech, RD Center, Mitsubishi Electric Co., Ltd.
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KANDA Takashi
BU Electronic Materials Clariant (Japan) K. K.
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TANAKA Hatsuyuki
BU Electronic Materials Clariant (Japan) K. K.
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KINOSHITA Yoshiaki
BU Electronic Materials Cariant (Japan) K.K.
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Ishibashi Takeo
Ulsi Development Center Mitsubishi Electric Co. Ltd.
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Kinoshita Yoshiaki
BU Electronic Materials Clariant (Japan) K. K., 3810 Chihama, Daito-cho, Ogasa-gun, Sizuoka 437-1496, Japan
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Watase Natsuo
AZ Electronic Materials, Clariant Corporation, 70 Meister Ave., Somerville, NJ 08876, USA
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Eakin Ron
AZ Electronic Materials, Clariant Corporation, 70 Meister Ave., Somerville, NJ 08876, USA
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Kanda Takashi
BU Electronic Materials Clariant (Japan) K. K., 3810 Chihama, Daito-cho, Ogasa-gun, Sizuoka 437-1496, Japan
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Yasuda Naoki
Advanced Tech. R/D Center, Mitsubishi Electric Co., Ltd., 8-1-1 Tsukaguchi-Honmachi, Amagasaki, Hyogo 661-8661, Japan
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