Comparison of Ge and GaAs Substrates for Metalorganic Vapor Phase Epitaxy of GaIn(N)As Quantum Wells
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概要
- 論文の詳細を見る
Comparison of Ge and GaAs substrates for the growth of InGaAs and GaInNAs quantum well structures is presented. Quantum well structures are grown simultaneously on both substrates by metalorganic vapor phase epitaxy. Photoluminescence measurements show lower peak energies for the structures grown on Ge than on GaAs. The luminescence redshift between structures grown on Ge and GaAs increases with increasing nitrogen precursor flow. X-ray diffraction analyses indicate that this is due to enhanced N incorporation efficiency on Ge.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2005-11-10
著者
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Lipsanen Harri
Optoelectronics Laboratory Helsinki University Of Technology
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Mattila Marco
Optoelectronics Laboratory Helsinki University Of Technology
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Reentila Outi
Optoelectronics Laboratory Micronova Helsinki University Of Technology
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Knuuttila Lauri
Optoelectronics Laboratory Micronova Helsinki University Of Technology
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Lipsanen Harri
Optoelectronics Laboratory, Micronova, Helsinki University of Technology, P.O. Box 3500, FIN-02015 HUT, Finland
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Mattila Marco
Optoelectronics Laboratory, Micronova, Helsinki University of Technology, P.O. Box 3500, FIN-02015 HUT, Finland
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- InGaAs/InP Quantum Dots Induced by Self-Organized InAs Stressor-Islands
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