ダイヤモンドライクカーボン成膜用低圧高周波CH4プラズマにおける基板への入射炭素フラックスに関する数値解析

概要

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Capacitively-coupled hydrocarbon (CH4) plasmas for deposition of diamond-like carbon films have been simulated using a self-consistent one-dimensional fluid model, incorporating the mass balance equations for electrons, ions, radicals and non-radicals, the electron energy balance equation, coupled with the Poisson equation. Despite of low-pressure CH4 gas condition, many positive-ion species, such as C2H4+, CH4+, C2H2+, CH5+ etc., have been found in the plasmas. The non-radical neutrals, such as C2H4, C3H8, C2H2 and C2H6, have also found with higher densities comparable to the source gas density. This result indicates that this complexity of background gas in CH4 plasmas is strongly affected to the electron energy distribution function, which is important for the determination of plasmas properties.