Nb系トンネル形ジョセフソン接合特性におよぼすスパッタクリーニングの影響

概要

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Effects of a sputter-cleaning of Nb base electrode on the Josephson junction characteristics have been investigated. Two types of junctions were prepared : One was with thermally oxidized Nb2O5 barrier and the other was with Si barrier. A comparison of the junction characteristics with each other revealed that dramatic degradations due to the sputter-cleaning were brought about only to the junction employing a Nb2O5 barrier, where the increased sputter-cleaning power resulted in the increased tunnel resistance by several orders of magnitude and the decreased gap parameter of Nb base electrode. An enhanced oxygen diffusion through the plasma bombarded Nb surface layer reasonably explained the observed junction degradation.
日本真空協会の論文