OS1805 二硫化モリブデンスパッタ膜の性状に及ぼすバイアス電圧の影響(OS18-2 薄膜・コーティング材の力学特性と微構造2,OS-18 薄膜・コーティング材の力学特性と微構造)

概要

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Sputtered molybdenum disulfide films having various internal stresses, composition (S/Mo ratio, impurity), interplanar spacing and crystalline orientation were prepared with various positive bias voltages on stainless substrate during rf sputtering for 3 Pa argon pressure. The films were investigated by FE-SEM, EPMA and XRD. Internal stress of films was obtained from curvature of substrate with film. The main results obtained are summarized as follows: Internal stresses of all films were compressive. An increase of bias voltage brings decrease of internal stress, argon contents in film, and (00・2) interplanar spacing. However, an increase of bias voltage brings increase of S/Mo ratio, deposition rate, true density, and oxygen contents in films. Iron as impurity was included for films prepared over bias voltage 45 V. Increase of bias voltage brings increase of iron contents in film.
一般社団法人日本機械学会の論文
2011-07-16