S0401-2-3 ナノインデンテーション法を用いたPVD薄膜の破壊靭性の評価([S0401-2]表面改質および薄膜コーティング(2))

概要

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The influence of bias voltage during deposition on the fracture toughness of CrN films was examined by nano indentation fracture (NIF) method. CrN films were deposited on austenitic stainless steel substrate by arc ion plating method under various bias voltages. The load-depth curves of the films were obtained by nanoindention method using Berkovich indenter. The elastic modulus E and the strain energy difference before and after cracking ΔU were calculated from the load-depth curves and film thickness t and the diameter of ring-like through-thickness crack 2C_R were also measured in order to determine the fracture toughness by NIF method. As the results, the fracture toughness of CrN film decreased with increasing negative bias voltage during the deposition. In particularly, the bias voltage strongly affected the fracture toughness in low bias voltage region. The result of XRD measurements showed little difference in the crystal orientation of the films, especially low bias voltage region.
2010-09-04