メタン/水素マイクロ波プラズマCVD法による純チタン基板上のナノダイヤモンド成膜

概要

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In contrast on microcrystalline diamond film, nanocrystalline diamond film has a flat and smooth surface. Therefore, nanocrystalline diamond film is desirable in application field of tribology. In this study, the nanocrystalline diamond film and the microcrystalline diamond film were deposited on pure titanium using CH_4/H_2 MPCVD method. The diamond film deposition was carried out under the deposition temperature of approximately 1173K and the deposition pressure of 8.0kPa. CH_4 concentration was changed from 0.5mol% to 5mol%. The deposition time was changed from 4h to 12h. The diamond film surface was observed by scanning electron microscopy (SEM). In the laser Raman spectra, the sharp peak of sp^3-bonded carbon was attributed to 1332cm^<-1> at microcrystalline diamond films. The band near 1140cm^<-1> was related to the feature of nanocrystalline diamond film. Diamond films were also analyzed using X-ray diffraction. It is confirmed from XRD profile that (111) and (220) exists in the nanocrystalline diamond film. Surface roughness of diamond films decreased with increasing CH_4 concentration. But, the surface roughness of diamond films was close to approximately 50nm when CEU concentration was changed from 2mol% to 5mol%. It was con-firmed that the nanocrystalline diamond film can be deposited by CH_4/H_2 MPCVD method under CH_4 concentration from 2mol% to 5mol%.
社団法人日本材料学会の論文
2005-01-15