Effects of N_2O Plasma Annealing on the Characteristics of Tantalum Oxide Thin Films Deposited on TaN/Ta Electrode
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概要
- 論文の詳細を見る
The effects of N2_O plasma annealing on the stmctural and leakage current characteristics of amorphous and crystallized TaO_x thin films deposited on a TaN/Ta bottom electrode by chemical vapor deposition at 350℃ were investigated. An interfacial Ta(O,N) layer was formed following the oxidation of the TaN electrode after plasma annealing the TaO_x, films of 〜25 nm thickness, which decreased the effective capacitance of the thin film capacitors, and the Ta(O,N) layer grew with increasing annealing time or temperature. The growth of the Ta(O,N) layer up to a thickness of 38 nm followed a linear oxidation law with an activation energy of 〜0.74 eV for the annealing of the amorphous TaOs films in a temperature range of 300℃-450℃. However, an activation energy of 〜1.18eV was found for the linear oxidation of TaN within an oxidation thickness of 22 nm, and then, the oxidation switched to a parabolic process with an activation energy of 〜0.8eV for annealing the crystallized TaO_x films. The current-voltage (I-V) relation of the TaOs films was asymmetric with respect to the biasing polarity, and the leakage current decreased with increasing annealing time or temperature due to the formation and growth of a Ta(O,N) layer. Barrier heights of 1.08 and 0.74eV were evaluated from the temperature dependence of the I-V characteristics for the Schottky emission in the amorphous and crystalline 50-nm-thick TaOs films annealed in N_2O plasma at 350℃ for l0 min, respectively.
- 社団法人応用物理学会の論文
- 2002-12-15
著者
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Wu Tai-bor
Department Of Material Science And Engineering National Tsing Hua University
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LIU Tzu-Ping
Department of Material Science and Engineering, National Tsing Hua University
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HUANG Ya-Huang
Department of Material Science and Engineering, National Tsing Hua University
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CHANG Chich-Shang
Department of Material Science and Engineering, National Tsing Hua University
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Liu Tzu-ping
Department Of Material Science And Engineering National Tsing Hua University
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Huang Ya-huang
Department Of Material Science And Engineering National Tsing Hua University
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Chang Chich-shang
Department Of Material Science And Engineering National Tsing Hua University
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