Effect of Sputtering-Target Composition on the Texturization of LaNiO3 Thin Films on Si Substrate

概要

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Highly (100)-textured LaNiO3 thin films were deposited on Si substrate via rf magnetron sputtering. X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS) were employed to characterize the texturization of LaNiO3 thin films deposited with targets of various compositions and at different substrate temperatures. It was found that a slight increase of the Ni/La ratio in the composition of the target could compensate the Ni loss on high temperature deposition, leading to an improved (100)-textured film structure. However, for deposition with targets having Ni/La ratio larger than 1.4 or substrate temperature higher than 450°C, the Ni loss was repressed and the (100)-textured structure was also degraded. The XAS results reveals that the target composition and the substrate temperature influenced the local structure as well as the electronic configuration of Ni atom in the deposited films, but the environment around La atom was little affected. The extended X-ray absorption fine structure results indicate that the change of structural and electronic environment around Ni atom is owing to a significant amount of NiO phase formed in the films deposited with the targets of high Ni/La ratio or at high substrate temperatures.
Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
1997-01-15