Effect of Etching on Composition and Morphology of CdTe(111) Surfaces
スポンサーリンク
概要
- 論文の詳細を見る
Various surface treatments, including wet chemical etching, heat treatment in H_2 and sputter etching with Ar ion, were applied to CdTe(111) surfaces. The induced surface layer and morphology were studied with angle-resolved X-ray photoelectron spectroscopy (ARXPS), Auger electron spectroscopy (AES) and atomic force microscopy (AFM). For wet chemical etching, both Br/methanol and KOH/methanol resulted in a Te-enriched surface, while the Te-rich layer induced by Br/methanol etching can be at least partially removed by treating with reducing etchants including hydrazine and dithionite. A hillock like morphology was the common feature of these wet-chemically etched surfaces. After hydrogen heat treatment, both Cd(111) and Te(111) surfaces were Cd-rich and a distinct difference in microscopic morphology between the Cd(111) and the Te(111) surfaces was observed. The surface morphology developed by hydrogen heat treatment can be used to identify the crystal polarity. The sputter etching caused compositional changes in the surface of CdTe(111), resulting in Te enrichment at the outermost layer but Te depletion in the subsurface region. Also, an Ar-ion-energy-dependent surface morphology was observed.
- 社団法人応用物理学会の論文
- 1995-11-15
著者
-
Yang T‐j
National Chiao Tung Univ. Hsinchu Twn
-
Yang Tian-juh
Department Of Material Science And Engineering National Tsing Hua University Hsinchu
-
WU Tai-Bor
Department of Materials Science and Engineering, National Tsing Hua University
-
Wu Tai-bor
Department Of Material Science And Engineering National Tsing Hua University
-
Wu Tai-bor
Department Of Material Science And Engineering National Tsing Hua University Hsinchu
関連論文
- Andreev Scattering in Semiconductor-Superconductor Junctions Containing a Finite Width Semiconductor Region Applied by Magnetic Fields (Condensed Matter : Electronic Structure, Electrical, Magnetic and Optical Properties)
- Effects of (100)-Textured LaNiO_3 Electrode on Crystallization and Properties of Sol-Gel-Derived Pb(Zr_Ti)O_3 Thin Films
- Deposition and Characterization of Ferroelectric Pb[(Mg_Nb_)_xTi_]0_3 Thin Films by RF Magnetron Sputtering
- Ferroelectric and Dielectric Characteristics of (Pb_La_y)[Mg_/3Nb_/3Ti_]O_3 Thin Films Prepared by RF Magnetron Sputtering
- Electrical Properties of High-Temperature Annealed Boron-Implanted Hg_Cd_Te
- Effect of Etching on Composition and Morphology of CdTe(111) Surfaces
- Highty (100)-Oriented Thin Films of Sol-Gel Derived Pb[(Mg)_Nb_)_Ti_]O_3 Prepared on Textured LaNiO_3 Electrode
- Effects of Bottom Electrode on the Structural and Electrical Characteristics of Barium Titanate Thin Films
- Structural and Electrical Characteristics of Ba(Zr_Ti_)O_3 Thin Films Deposited on LaNiO_3 Electrode by RF Magnetron Sputtering
- Annealing Effects on the Hall Properties of Hg_Cd_xTe Heterolayers Grown by Liquid Phase Expitaxy
- Effect of Sputtering-Target Composition on the Texturization of LaNiO3 Thin Films on Si Substrate
- Effects of LaNiO_3 Conductive Buffer Layer on The Structural and Electrical Characteristics of Ba_Sr_TiO_3 Thin Films Prepared by RF Magnetron Sputtering
- Effects of N_2O Plasma Annealing on the Characteristics of Tantalum Oxide Thin Films Deposited on TaN/Ta Electrode
- Polarization Switching Characteristics of Pb(Zr_Ti_)O_3 Thin Films Deposited on Vacuum-Annealed PtO_x/Pt Electrode
- Structural and Electrical Characteristics of Ba(Zr0.12Ti0.88)O3 Thin Films Deposited on LaNiO3 Electrode by RF Magnetron Sputtering
- Microstructure and Nonohmic Properties of ZnO-V_2O_5 Ceramics
- Evaluation of the WOx Film Properties for Resistive Random Access Memory Application