Influence of Initial Amorphous Layer Deposition Temperature on Lateral Solid-Phase Epitaxy of Silicon
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-02-15
著者
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HASEGAWA Hideki
Graduate School of Electronics and Information Engineering and Research Center for Integrated Quantu
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Moniwa M
Graduate School Of Electronics And Information Engineering Hokkaido University:manufacturing Process
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Moniwa Masahiro
Graduate School Of Information Sci. And Technol. Hokkaido Univ. Sapporo 060-0814 Japansemiconductor
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Moniwa Masahiro
Graduate School Of Electronics And Information Engineering Hokkaido University:manufacturing Process
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Hasegawa Hideki
Graduate School of Electronics and Information Engineering and Research Center for
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