1859 MEMSマイクロミラーの強度に及ぼすエッチングダメージの影響(J09-4 有限要素解析と強度信頼性評価,J09 電子情報機器,電子デバイスの熱制御と強度・信頼性評価)

概要

論文の詳細を見る
Strength of MEMS micromirror is greatly affected by various kinds of ICP-RIE damage. Notching is one of the most important etching damage in MEMS fabrication process. Many experimental approaches toward notching-free process have been carried out. We have proposed a dual-direction bending test method for evaluating the strength of the notching damage subjected to torsion loading. Proposed method is applied to two kinds of specimens involving different etching damage and same geometry. As a result, it is found that the strength of the specimen with 0.25μm notching roughness is 1148MPa and that with 0.13μm is 1353MPa. It exists linear relationship between notching roughness and strength. As the roughness decreases 0.1μm, the increase in the strength of about 450MPa can be observed
一般社団法人日本機械学会の論文
2005-09-18