Titanium Nitride Membrane Application to Extended Gate Field Effect Taansistor pH Sensor Using VLSI Technology : Semiconductors
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-11-15
著者
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Hsiung S‐k
Chung Yuan Christian Univ. Chung‐li Twn
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Hsiung Shen-kan
Institute Of Electronic Engineering Chung Yuan Christian University
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Chou J‐c
National Yunlin Univ. Sci. And Technol. Yunlin Twn
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CHOU Jung-Chuan
Institute of Electronics, National Chiao Tung University
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Chiang Jung-lung
Department Of Electronic Engineering Chung Chou Institute Of Technology
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Chin Y‐l
National Chiao Tung Univ. Hsinchu Twn
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Sun T‐p
Institute Of Electrical Engineering National Chi Nan University
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Chung W‐y
Institute Of Electronic Engineering Chung Yuan Christian University
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CHIN Yuan-Lung
Institute of Electronic Engineering, Chung Yuan Christian University
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LET Zhen-Ce
Institute of Electronic Engineering, Chung Yuan Christian University
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SUN Tai-Ping
Institute of Electrical Engineering, National Chi Nan University
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CHUNG Wen-Yaw
Institute of Electronic Engineering, Chung Yuan Christian University
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Let Zhen-ce
Institute Of Electronic Engineering Chung Yuan Christian University
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Chou Jung-chuan
Institute Of Electronic And Information Engineering National Yunlin University Of Science And Techno
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Lei Zhen-Ce
Institute of Electronic Engineering, Chung Yuan Christian University
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- Titanium Nitride Membrane Application to Extended Gate Field Effect Taansistor pH Sensor Using VLSI Technology : Semiconductors
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