Reduction of Selectivity Loss Probability on Dielectric Surface during Chemical Vapor Deposition of Tungsten Using Fluorinated Oxide and Removing Silanol Units on Dielectric Surface

スポンサーリンク

概要

著者

WANG Shih
Department of Cosmetic Applications & Management, Cardinal Tien College of Healthcare & Management
Tsai Jung
Department Of Electronic Engineering And Institute Of Electronics National Chiao Tung University Nat
CHANG Kow
Department of Electronic Engineering and Institute of Electronics, National Chiao Tung University, N
LI Chii
Department of Electronic Engineering and Institute of Electronics, National Chiao Tung University, N
YEH Ta
Department of Electronic Engineering and Institute of Electronics, National Chiao Tung University, N
Yeh Ta
Department Of Electronic Engineering And Institute Of Electronics National Chiao Tung University Nat
Li Chii
Department Of Electronic Engineering And Institute Of Electronics National Chiao Tung University Nat
Wang Shih
Department Of Electronic Engineering And Institute Of Electronics National Chiao Tung University Nat
Chang K
National Chiao‐tung Univ. Hsin‐chu Twn

関連論文

もっと見る

スポンサーリンク