Reoxidation Behavior of High-Nitrogen Oxynitride Films after O_2 and N_2O Treatment
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概要
- 論文の詳細を見る
- 2005-05-15
著者
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Yao June
Department Of Electronic Materials Far East College
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CHANG Kow
Department of Electronic Engineering and Institute of Electronics, National Chiao Tung University, N
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LIN Bo
Department of Electronic Engineering, Northern Taiwan Institute of Science and Technology
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LAI Chiung
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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HSIEH Kuang
Nano-technology R&D Div.
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YAO June
Emerging Central Lab. Macronix International Co. Ltd
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