In Situ Fabrication of Reproducible YBCO/Au Planar Tunnel Junctions with an Artificial MgO Barrier
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概要
- 論文の詳細を見る
The in situ fabrication of YBCO (YBa_2Cu_3O_y)/MgO/Au epitaxial planar tunnel junctions with a thin MgO barrier utilizing an electron-beam coevaporation technique is reported. The thickness of the MgO barrier is 3-12 nm and the tunnel resistance shows a strong dependence on barrier thickness. The fabricated tunnel junctions are highly re-producible and controllable. The observed tunnel characteristics contain the gap opening at about 20 mV and the anomaly around zero bias. The tunnel characteristics using the degraded films are also reported.
- 社団法人応用物理学会の論文
- 1990-03-20
著者
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Shirai K
Division Of Applied Biology Faculty Of Textile Science And Technology Shinshu University
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Shirai K
Tokyo Denki Univ. Tokyo
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Shirai Koji
Institute Of Genetic Resources Faulty Of Agriculture Kyushu University
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FURUYAMA Masafumi
Institute for Materials Research, Tohoku University
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Iguchi I
Department Of Physics Tokyo Institute Of Technology
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Iguchi Ienari
Institute Of Materials Science University Of Tsukuba
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Ohtake H
Institute For Molecular Science
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KUSUMORI Takeshi
Institute of Materials Science, University of Tsukuba
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TOMURA Shoji
Institute of Materials Science, University of Tsukuba
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NASU Masako
Institute of Materials Science, University of Tsukuba
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OHTAKE Hiroaki
Institute of Materials Science, University of Tsukuba
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Nasu Masako
Institute Of Materials Science University Of Tsukuba
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Tomura Shoji
Institute Of Materials Science University Of Tsukuba
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Kusumori T
Institute Of Materials Science University Of Tsukuba
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Kusumori Takeshi
Institute Of Materials Science University Of Tsukuba
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Furuyama M
Institute Of Materials Science University Of Tsukuba
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Furuyama Masafumi
Institute For Materials Research Tohoku University
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