Preparation of Ferroelectric PbTiO_3 Thin Film by Reactive Sputtering
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概要
- 論文の詳細を見る
Ferroelectric PbTiO_3 thin films have been successfully obtained. The films were fabricated by reactive sputtering using a simple metal composite as a target. Without postannealing, the films with perovskite structure have been obtained at substrate temperatures of 600-620℃. The spontaneous polarization (P_S) and the coercive field (E_C) of a 0.70 μm-thick film were measured as 37 μC/cm^2 and 86 kV/cm, respectively.
- 社団法人応用物理学会の論文
- 1991-04-15
著者
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OKAMURA Takeshi
Department of Gastroenterological Surgery, National Kyushu Cancer Center
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Okamura T
Central Research Laboratory Kyocera Corporation
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Okamura Takeshi
Department Of Electronics Faculty Of Engineering Kyoto University
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Okamura Takeshi
Electrotechnical Laboratory:(present Address) Central Research Laboratory Kyocera Corporation
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Kawabata A
Department Of Electronics And Informatics Faculty Of Engineering Toyama Prefectural University
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Kawabata Akira
Department Of Electronics And Informatics Faculty Of Engineering Toyama Prefectural University
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Okamura T
Optical Disks Development Department Division Of Information And Devices Technologies Asahi Chemical
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ADACHI Masatoshi
Kyocera Corporation
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SHIOSAKI Tadashi
Kyocera Corporation
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KAWABATA Akira
Kyocera Corporation
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Adachi Masatoshi
Department Of Electronics And Informatics Faculty Of Engineering Toyama Prefectural University
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