Control of Hydrocarbon Radicals and Amorphous Carbon Film Deposition by Means of RF Whistler Wave Discharge
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概要
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Hydrocarbon radicals are produced and controlled by using a radio-frequency (RF) whistler wave discharge in a low-pressure region (∼0.1 Pa). Plasma density of 10^<10>-10^<13> cm^<-3>, at an electron temperature of 2-20 eV is obtained for the discharge of an admixture of Ar and a small amounts of source gases (CH_4, C_2H_2, CO). Densities of CH and H radicals and deposition rate of amorphous carbon:H film increase with electron density, electron temperature and source gas pressure. Both neutral radicals and ionic radicals play an important role in the deposition, and the etching effect of H atoms reduces the deposition rate. A high deposition rate (90 μm/h for CO/Ar discharge) is obtained even for a low-neutral-pressure discharge.
- 社団法人応用物理学会の論文
- 1992-06-15
著者
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SHOJI Tatsuo
Plasma Science Center, Nagoya University
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Mieno Tetsu
Department Of Physics Shizuoka University
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Mieno Tetsu
Department Of Physics Faculty Of Science Shizuoka University
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Shoji Tatsuo
Plasma Science Center Nagoya University
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Kadota Kiyoshi
Plasma Science Center Nagoya University
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