Fluorination of Fullerene Film by CF_4 Plasma
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概要
- 論文の詳細を見る
Fullerene thin film is fluorinated by a cold cathode DC discharge of CF_4 gas. From the measurement of a laser-desorption time-of-flight mass spectrometer, it is confirmed that the surface of fullerene film becomes fullerene fluoride such as C_<60>F_x (x=15-51), and that C_<60>F_<33> has the largest intensity. It is believed that fluorination is performed by F radicals and F^- ions in the plasma. This fluorination method is safe and is attractive for producing fullerene fluoride film on solid substrates.
- 社団法人応用物理学会の論文
- 1995-04-01
著者
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SAKURAI Atsushi
Department of Neurology, Institute of Severe Motor and Intellectual Disabilities
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Mieno Tetsu
Department Of Physics Faculty Of Science Shizuoka University
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Sakurai Atsushi
Department Of Chemistry Faculty Of Science Shizuoka University
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Sakurai Atsushi
Deparment Of Neurology Gunma University School Of Medicine
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SAKURAI Atsushi
Department of Chemistry, Faculty of Science, Shizuoka University
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