Surface Effects on Leakage Current and Lifetime in Pt Diffused Planar Silicon p^+n Diodes

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-05-15

著者

• Shu Chang

  Faculty Of Science And Technology Keio University

• KUWANO Hiroshi

  Faculty of Science and Technology, Keio University

• SAGALA Pahlawan

  Faculty of Science and Technology, Keio University

• Kuwano Hiroshi

  Faculty Of Science And Technology Keio University

• Sagala Pahlawan

  Faculty Of Science And Technology Keio University

• SHU Chang

  Faculty of Science and Technology, Keio University

関連論文

• Effects of Platinum Diffusion on MOS System
• Annealing Behavior of Defects Induced by Self-Implantation in Si
• Damage and Its Rapid Thermal Annealing Behavior of 1 MeV Ar^+-Ion-Implanted Silicon
• Reduction of Mobile Pt Ion Density in SiO_2 and Si-SiO_2 Interface State Density in Pt-diffused Metal-Oxide-Semiconductor Structures
• Improvement of Electrical Characteristics of Pt-Diffused Devices
• Surface Effects on Leakage Current and Lifetime in Pt Diffused Planar Silicon p^+n Diodes
• Platinum as Recombination-Generation Centers in Silicon
• Dose Dependence of Recrystallization Behavior in Germanium-Ion-Implanted Polycrystalline Silicon Films
• Control of Resistivity of Polycrystalline Si Films by Solid-Phase Recrystallization (SPR) : Semiconductors and Semiconductor Devices
• Reduction of Leakage Current and Minority Carrier Lifetime in Platinum-Diffused pn Diodes
• Oscillation in Semiconductors with a Dumbbell-Shaped Structure
• Determination of the Energy Distribution of Grain Boundary Traps in Polycrystalline Silicon Films

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