X-Ray Microdiffraction with a Scanning X-Ray Microanalyzer
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概要
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A method similar to the selected area microdiffraction in electron microscopy has been tried with an electron probe X-ray microanalyzer of the scanning type. By irradiating the finely focused electron beam on a film target and passing the generated X-rays through a pinhole slit, an X-ray micro-beam of about 10μ in diameter was obtained. After selecting a desired region for X-ray microdiffraction by observing scanning images of a specimen surface, the X-ray micro-beam was made to irradiate this area. A back-reflection diffraction pattern was recorded on a film placed at a distance of 11 mm from the specimen surface. With an accelerating voltage of 35 kV and a probe current of 2μA, the specific load of electrons on the target was about 10 kW/mm^2. Exposure times were 30 min. for copper metal and 2 hours for zinc blende particles in a chalcopyrite ore when a copper target of several microns was used. Some applications were carried out for specimens of rolled copper plate, chalcopyrite ore, and evaporated permalloy film. With the microdiffraction patterns, it was possible to confirm results of quantitative analysis of elements, to determine orientations of crystallites, and to measure strains in fine crystals.
- 社団法人応用物理学会の論文
- 1966-09-15
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