A Negative Resistance in a MOS Structure

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1965-05-15

著者

• KUWANO Hiroshi

  Department of Electrical Engineering, Faculty of Science and Technology, Keio University

• Niimi Tatsuya

  Electrical Communication Laboratory Ntt

• Niimi Tatsuya

  Electrical Communication Laboratory

• ARIYOSHI Hisashi

  Electrical Communication Laboratory, NTT

• Kuwano Hiroshi

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• Ariyoshi Hisashi

  Electrical Communication Laboratory Ntt

• Kuwano Hiroshi

  Department Of Electrical Engineering Keio Univ.

関連論文

• Lateral Solid-Phase Recrystallization from the Crystal Seed Selectively Formed by Excimer Laser Annealing in Ge-Ion-Implanted Amorphous Silicon Films
• Observations of Negative Resistance Phenomena and Oscillations in Si-SiO_2-Metal Diodes
• A Negative Resistance in a MOS Structure
• Effects of Crystal Originated Particles on Breakdown Characteristics of Ultra Thin Gate Oxide
• Effects of Various Hydrogenation Processes on Bias-Stress-Induced Degradation in p-Channel Polysilicon Thin Film Transistors
• Mechanisms of Electrical Stress-Induced Degradation in H_2/Plasma Hydrogenated n- and p-Channel Polysilicon Thin Film Transistors
• Lateral Solid Phase Recrystallization from the Crystal Seed in Ge-Ion-Implanted Amorphous Silicon Films by Repetition Rapid Thermal Annealing
• Origin of Infrared Photoluminescence of Nanocrystalline Si in SiO_2 Films
• Effects of Denudation Anneal of Silicon Wafer on the Characteristics of Ultra Large-Scale Integration Devices
• Lateral Solid Phase Recrystallization from the Crystal Seed in Ge-Ion-Implanted Amorphous Silicon Films by Repetition Rapid Thermal Annealing
• Lateral Solid-Phase Recrystallization from the Crystal Seed Selectively Formed by Excimer Laser Annealing in Ge-Ion-Implanted Amorphous Silicon Films
• On the Changes in Contact Potential Difference of a Germanium Rectifier During the Electrical Forming

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