回転金膜電極を用いる示差パルスアノーディックストリッピングボルタンメトリーによる蛍石中ヒ素の定量

概要

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A simple and precise method is described for the determination of arsenic in fluorspar by differential pulse anodic stripping voltammetry without any pretreatment steps using harmful chemicals. Arsenic(V) was reduced to arsenic(III) with potassium iodide. The arsenic(III) in an acidic solution was electrodeposited on a rotating gold-film electrode at -0.45 V vs. SCE for 180 s, and then a stripping voltammogram was recorded by a positive-going scan at a rate of 40 mV s^<-1> to 0.2 V vs. SCE. The calibration {peak height rS. arsenic(III) concentration} curve was linear over the range (1.3〜4.0) ×10^<-7> M arsenic(III) and passed through the origin. The detection limit (3σ) was 1.98 × 10^<-8> M. Copper(II), lead(II), and antimony(III) interfered with the arsenic(III) determination severely. The determination of 10.6 μg g^<-1> of arsenic in fluorspar was achieved with an RSD (n=5) of 3.4% within 3 h. The proposed method is an improvement over the existing JIS method.
社団法人日本分析化学会の論文
2000-05-05