光投影法における反射光強度分布の補正

概要

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When a ray is projected on an object with nonuniform reflection, the intensity distribution of the reflected ray is distorted, compared with that of the incident one. This paper proposes a new correction method applicable to this case. In the method, the distorted intensity distribution is corrected on the basis of a reflection distribution. The reflection distribution is measured by using a reference light having a uniform intensity distribution. First, a required spectrum distribution is clarified for the reference light, and a permeable band of filter mounted on an TV camera lens is determined. Then, the quantity of blurring at a boundary is found to be in proportion to the intensity difference between areas adjacent to the boundary, and the correction effect in relation to the blurring is determined quantitatively. By applying this correction method to a slit-ray position measurement, it is clarified that distortion is corrected and that the slit-ray position is measured several times more accurately than without correction.
一般社団法人日本機械学会の論文
1987-11-25