プラズマCVD法による TiN 膜形成過程における活性プラズマ種

概要

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In order to investigate the formation process of titanium nitride (TiN) films by the plasma chemical vapor deposition (CVD) method utilizing d.c. glow discharge, a plasma diagnostic study by optical emission spectroscopy (OES) and quadrupole mass spectrometry (QMS) was carried out. The dependence of optical emission intensities or mass intensities of the obesrved plasma species on plasma CVD operating parameters was investigated, and their spatial distributions were observed. Plasma species which increase their densities in the cathode sheath region near the surface of the substrate were identified. From these results, Ti^+ ions and NH radicals are proposed to be active plasma species which play important roles in the TiN film formation reaction. Formation processes of the plasma species are presumed.
社団法人日本セラミックス協会の論文
1992-10-01