Quench Deposited Amorphous TlI Films and Their Crystallization Studied by Optical Absorption Measurements
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概要
- 論文の詳細を見る
1-]ig1? quality anaorplaous Tll filn?s w'ere obtaixted w'laiclx are stable below 111 K axadcorn)cletely trauasparexal below tlae absorptioxa edge. Ul)011 ]aeat?ng, tltey SIIOVV a sl?arpcrystallization behavior in a snaall texva?ceratur<: range less tltan 2 K near 121 K. The as-crystallized filzns just above tlae crystallization temnperature ltax'e a nvicrocrystalluaaenature claaraclerized b)' the blue shift of tlae lst excitou? band. The blue sl?xft 35 at-tri buted to tlte quaxatum size effect on excitouas coxafi?aed in a nticrocrystlline gz'aixa witha mean size of a few times t]?e exciton Bolar radius.[Tl1, llaallous halide, amorphous, opticztl property, microcrystal, e>;citon, l] quex?ch-de)cosited fi1n?, tlain filml
- 社団法人日本物理学会の論文
- 1992-10-15
著者
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Kondo Shin-ichi
Department Of Applied Physics Faculty Of Engineering Fukui University
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NAKANO Mitsuru
Murata Manufacturing Co., Ltd.
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Nakano M
Murata Manufacturing Co. Ltd.
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Nakano Mitsuru
Department Of Applied Physics Faculty Of Engineering Fukui University
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