半導体レーザによるパターン描画の研究 : 1次元濃度分布光学フィルタの描画

概要

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A pattern drawing system on a photographic film was developed. This system consists of a laser diode for a light source, and a cylindrical lens for changing the beam profile to the linear. Before drawing patterns, the exposure characteristics were measured on the LD wave length, and then LD power was modulated for desired patterns. Some diffraction patterns were calculated depending on numerical aperture of collimators. Rotating the collimated beam by the dove prism, the most suitable focusing direction, was obtained experimentally for uniform power distribution on the focus of the cylindrical lens. Using an 8 bit D/A converter, one dimensional arbitrary patterns were drawn with 256 level gradations of density. For example, periodic sinusoidal patterns, fractional distribution patterns for optical range meters. Drawn area of the film was 200mm (film length)×9mm(linear beam length)by one scanning.
公益社団法人精密工学会の論文
1993-07-05