InGaN Channel High-Electron-Mobility Transistors with InAlGaN Barrier and f_T/f_<max> of 260/220GHz
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概要
- 論文の詳細を見る
- 2013-01-25
著者
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Snider Gregory
Department Of Electrical Engineering University Of Notre Dame
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Johnson Wayne
Kopin Corporation
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WANG Ronghua
Department of Electrical Engineering, University of Notre Dame
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LI Guowang
Department of Electrical Engineering, University of Notre Dame
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HU Zongyang
Department of Electrical Engineering, University of Notre Dame
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LABOUTIN Oleg
Kopin Corporation
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CAO Yu
Kopin Corporation
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JENA Debdeep
Department of Electrical Engineering, University of Notre Dame
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XING Huili
Department of Electrical Engineering, University of Notre Dame
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Fay Patrick
Department Of Electrical Engineering University Of Notre Dame
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Verma Jai
Department Of Electrical Engineering University Of Notre Dame
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Xing Huili
Department Of Electrical Engineering University Of Notre Dame
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Yue Yuanzheng
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
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Faria Faiza
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
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Karbasian Golnaz
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
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Guo Jia
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
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FARIA Faiza
Department of Electrical Engineering, University of Notre Dame
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