Karbasian Golnaz | Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
スポンサーリンク
概要
- Karbasian Golnazの詳細を見る
- 同名の論文著者
- Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.の論文著者
関連著者
-
Snider Gregory
Department Of Electrical Engineering University Of Notre Dame
-
Johnson Wayne
Kopin Corporation
-
WANG Ronghua
Department of Electrical Engineering, University of Notre Dame
-
LI Guowang
Department of Electrical Engineering, University of Notre Dame
-
HU Zongyang
Department of Electrical Engineering, University of Notre Dame
-
LABOUTIN Oleg
Kopin Corporation
-
CAO Yu
Kopin Corporation
-
JENA Debdeep
Department of Electrical Engineering, University of Notre Dame
-
Fay Patrick
Department Of Electrical Engineering University Of Notre Dame
-
Verma Jai
Department Of Electrical Engineering University Of Notre Dame
-
Xing Huili
Department Of Electrical Engineering University Of Notre Dame
-
Yue Yuanzheng
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
-
Faria Faiza
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
-
Karbasian Golnaz
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
-
Guo Jia
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
-
FARIA Faiza
Department of Electrical Engineering, University of Notre Dame
-
Guo Jia
Department Of Electronics Engineering Shanghai Jiao Tong University
-
XING Huili
Department of Electrical Engineering, University of Notre Dame
-
Johnson Wayne
Kopin Corporation, Taunton, MA 02780, U.S.A.
-
Jena Debdeep
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
-
Laboutin Oleg
Kopin Corporation, Taunton, MA 02780, U.S.A.
-
Li Guowang
Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, U.S.A.
著作論文
- InGaN Channel High-Electron-Mobility Transistors with InAlGaN Barrier and f_{\text{T}}/f_{\text{max}} of 260/220 GHz
- InGaN Channel High-Electron-Mobility Transistors with InAlGaN Barrier and f_T/f_ of 260/220GHz