Fabrication of Ultrasmall High-Quality Bi_2Sr_2CaCu_2O_<8+δ> Intrinsic Josephson Junctions
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2008-10-25
著者
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EISAKI Hiroshi
Nanoelectronics Research Institute (NeRI), AIST
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Eisaki Hiroshi
Nanoelectronics Research Institute (neri) National Institute Of Advanced Industrial Science And Tech
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YOSHIDA Yoshiyuki
National Institute of Advanced Industrial Science and Technology
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YOSHIDA Yoshiyuki
Nanoelectronics Research Institute, AIST
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Koikegami S
Jsps Tokyo
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Yoshida Yoshiyuki
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
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MATSUMOTO Tetsuro
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Tec
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KASHIWAYA Hiromi
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Tec
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SHIBATA Hajime
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Tec
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KASHIWAYA Satoshi
Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Tec
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Yoshida Yoshiyuki
Nanoelectronics Research Institute (neri) National Institute Of Advanced Industrial Science And Tech
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Shibata Hajime
Nanoelectronics Research Institute (neri) National Institute Of Advanced Industrial Science And Tech
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Matsumoto Tetsuro
Nanoelectronics Research Institute (neri) National Institute Of Advanced Industrial Science And Tech
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Kashiwaya Hiromi
Nanoelectronics Research Institute (neri) National Institute Of Advanced Industrial Science And Tech
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Kashiwaya Satoshi
Nanotechnology Research Institute Aist
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Kashiwaya Satoshi
Nanoelectronics Research Institute (neri) National Institute Of Advanced Industrial Science And Tech
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