Influences of Elastic and Inelastic Scatterings on Ballistic Transport in MOSFETs
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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Takagi Shin-ichi
Mirai-aset
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Tsuchiya Hideaki
Kobe University Department Of Electrical And Electronics Engineering
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Takagi Shin-ichi
Mirai-asrc
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Tsuchiya Hideaki
Kobe University Graduate School Of Engineering
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Takagi Shin-ichi
MIRAI Project, Association of Super-Advanced Electronics Technology, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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- Performance Enhancement under High-Temperature Operation and Physical Origin of Mobility Characteristics in Ge-rich strained SiGe-on-Insulator pMOSFETs
- Impact of Gradual Source/Drain Impurity Profiles on Performance of Germanium Channel Double-Gated pMISFETs
- High mobility Ge channel metal source/drain pMOSFETs with nickel fully silicided gate
- Ion-Implanted B Concentration Profiles in Ge
- Quantitative Evaluation of Interface Trap Density in Ge-MIS Interfaces
- Modulation of NiGe/Ge Schottky Barrier Height by Dopant and Sulfur Segregation during Ni Germanidation for Metal S/D Ge MOSFETs
- Comparative Study on Drive Current of III-V Semiconductor, Ge and Si Channel n- mosfets based on Quantum-Corrected Monte Carlo Simulation
- A Picture of Quasi-Ballistic Transport in Nanoscale MOSFETs
- A quantum-corrected Monte Carlo study on quasi-ballistic transport in nanoscale MOSFETs
- Single Source Heterojunction Metal--Oxide--Semiconductor Transistors for Quasi-Ballistic Devices: Optimization of Source Heterostructures and Electron Velocity Characteristics at Low Temperature
- Variation of Threshold Voltage in Strained Si Metal–Oxide–Semiconductor Field-Effect Transistors Induced by Non-uniform Strain Distribution in Strained-Si Channels on Silicon–Germanium-on-Insulator Substrates
- Role of Carrier Transport in Source and Drain Electrodes of High-Mobility MOSFETs
- A First Principles Study on Electronic Band Structures of Nano-Scaled SOI Films
- Influences of Elastic and Inelastic Scatterings on Ballistic Transport in MOSFETs
- Analysis of Microstructures in SiGe Buffer Layers on Silicon-on-Insulator Substrates
- Ion-Implanted B Concentration Profiles in Ge