Crown-Ether Cyanide Treatment to Eliminate Interface States at Si/SiO_2 Interfaces
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概要
- 論文の詳細を見る
- 1999-09-20
著者
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KOBAYASHI Hikaru
Institute of Scientific and Industrial Research, Osaka University
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YONEDA Kenji
ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co
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NISHITANI Mikihiko
Display Device Development Center, Matsushiita Electric Industrial Co.
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Nishitani Mikihiko
Display Device Development Center Matsushita Electrics Industrial Co. Ltd.
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Yoneda Kenji
Ulsi Process Technology Development Center Matsushita Electronics Corporation
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ASANO Akira
Institute for Protein Research, Osaka University
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KANAZAKI Emi
Institute of Scientific and Industrial Research, Osaka University
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TODOKORO Yoshihiro
Corporate Planning Department, Matsushita Electronics Corporation
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Todokoro Yoshihiro
Corporate Planning Department Matsushita Electronics Corporation
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Kanazaki Emi
Institute Of Scientific And Industrial Research Osaka University
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Kobayashi Hikaru
Institute Of Scientific And Industrial Research Osaka University
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Asano Akira
Institute Of Scientific And Industrial Research Osaka University
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Asano Akira
Institute For Protein Research Osaka University
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