Electrical Properties of Low-Dielectric-Constant SiOC(-H) Films Prepared by Plasma-Enhanced Chemical Vapor Deposition from Methyltriethoxysilane and O_2
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-10-30
著者
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Lee Kwang
Faculty Of Electrical And Electronics Engineering Cheju National University
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NAVAMATHAVAN Rangaswamy
Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University
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OH Kyoung
Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University
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CHANG Sil
Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University
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KIM Seung
Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University
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JANG Yong
Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University
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JUNG An
Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University
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LEE Heon
Department of Mechanical, Energy and Production Engineering, Cheju National University
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CHOI Chi
Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University
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Choi C
Nano Thin Film Materials Laboratory Department Of Physics Cheju National University
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Oh Kyoung
Nano Thin Film Materials Laboratory Department Of Physics Cheju National University
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Jung An
Nano Thin Film Materials Laboratory Department Of Physics Cheju National University
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Choi C
Department Of Physics Cheju National University
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Choi Chi
Nano Thin Film Materials Laboratory Department Of Physics Cheju National University
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Jang Yong
Nano Thin Film Materials Laboratory Department Of Physics Cheju National University
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Chang Sil
Nano Thin Film Materials Laboratory Department Of Physics Cheju National University
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Kim Seung
Nano Thin Film Materials Laboratory Department Of Physics Cheju National University
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Navamathavan Rangaswamy
Nano Thin Film Materials Laboratory Department Of Physics Cheju National University
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Lee Heon
Department Of Mechanical Energy And Production Engineering Cheju National University
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Lee Kwang
Faculty Of Agriculture Shimane University
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Lee Heon
Department of Material Science and Engineering, Korea University, 5-1 Anam-dong, Sungbuk-ku, Seoul 136-701, Korea
関連論文
- Electrical Properties of Low-Dielectric-Constant SiOC(-H) Films Prepared by Plasma-Enhanced Chemical Vapor Deposition from Methyltriethoxysilane and O_2
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