Reflection Multiple Beam Wedge Plate Shear Interferometry for Lens Testing

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概要

• 論文の詳細を見る
• 1994-12-01

著者

• Barnes T

  Physics Department University Of Auckland

• EIJU Tomoaki

  Applied Physics and Information Science Department, Mechanical Engineering Laboratory

• MATSUDA Kiyofumi

  Applied Physics and Information Science Department, Mechanical Engineering Laboratory

• BARNES Thomas

  Physics Department, University of Auckland

• SIROHI Rajpal

  Applied Optics Laboratory, Physics Department, Indian Institute of Technology

• Matsuda Kazuko

  Faculty Of Engineering Kanazawa University

• Matsuda K

  Univ. Cambridge Cambridge Gbr

• Matsuda K

  Waseda Univ. Tokyo Jpn

• Eiju T

  Mechanical Engineering Laboratory

• Sirohi Rajpal

  Applied Optics Laboratory Physics Department Indian Institute Of Technology

関連論文

• Bistable Optically Writable Image Memory Using Optical Feedback
• A Novel Shearing Interferometer with Direct Display of Lens Lateral Aberrations
• Reflection Multiple Beam Wedge Plate Shear Interferometry for Lens Testing
• Nature of Oxygen Donors and Radiation Defects in Oxygen-Doped Germanium
• Characterization of GaAs Surfaces Treated with Remote PH_3 Plasma
• Characterization of InGaAs Phosphidized by a Plasma Process
• Behavior of Electron Traps in Phosphidized GaAs by Nitrogen Plasma Treatment
• Improvement of Coupling Efficiency for Passive Alignment of Stacked Multifiber Tapes to a Vertical-Cavity Surface-Emitting Laser Array
• Preparation of Bi-Iron-Garnet Films on Platinized Si Substrate with Bi-Substituted Y-Iron-Garnet Template Layer (レーザーによる薄膜形成と制御小特集号)
• Improvement on Coupling Efficiency for Passive Alignment of Stacked Multi-Fiber Tapes to a Vertical-Cavity Surface-Emitting Laser Array
• Mechanism of Stoichiometric Deposition of Volatile Elements in Multimetal-Oxide Films Prepared by Pulsed Laser Ablation
• Deep Electron Traps in n-InP Induced by Plasma Exposure
• Effect of Hydrogen Plasma Treatment on n-InP Surfaces
• Characteristics of Electron Trap Induced in n-InP by Hydrogen Plasma Exposure
• Surface-Emitting Laser with a Common-Anode Configuration for Application to the Photonic Parallel Memory
• Effect of Phosphine on Plasma-Induced Traps in n-InP
• Measurement of Surface Fermi Level in Phosphidized GaAs
• Second-Order Piezoresistance Coefficients of p-Type Silicon
• Evidence for Phosphorus Passivation of Plasma-Induced Damage at GaAs Surface Probed by EL2 Traps
• Effect of Angular Distribution of Ejected Atoms from a Target on the Uniformity of Thickness and Composition of MoSi_x Sputtering Films
• Second-Order Piezoresistance Coefficients of n-Type Silicon
• Purification and Properties of a Novel Sulfatase from Pseudomonas testosteroni That Hydrolyzed 3β-Hydroxy-5-cholenoic Acid 3-Sulfate
• Accumulation of Translational Inhibitor durig Multi-Hour Cell-Free Protein Synthesis Reaction Using Rabbit Reticulocyte Lysate
• Purification and Properties of Bile Acid Sulfate Sulfatase from Pseudomonas testosteroni
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• Growth Inhibition of Pseudomonas solanacearum by Substituted 3-Indolepropionic Acids and Related Compounds
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• A Novel Sulfatase from Pseudomonas testosteroni Hydrolyzing Lithocholic Acid Sulfate
• Indole as an Antibacterial Substance against Pseudomonas solanacearum(Organic Chemistry)

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