Fundamental Properties of Organic Low-k Dielectrics Usable in the Cu Damascene Process
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-11-30
著者
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KURINO Hiroyuki
Department of Machine Intelligence and Systems Engineering, Tohoku University
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KOYANAGI Mitsumasa
Department of Machine Intelligence and Systems Engineering, Tohoku University
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Kurino Hiroyuki
Department Of Bioengineering And Robotics Tohoku University
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Nomura Yutaka
Research And Development Center Hitachi Chemical Co. Ltd.
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OTA Fumihiko
Research and Development Center, Hitachi Chemical Co., Ltd.
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