THE INFLUENCE OF INTEGRATION PROCESS ON THE IMPRINT IN PT-PZT-PT FERROELECTRIC CAPACITORS
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概要
- 論文の詳細を見る
- 1997-12-04
著者
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Lee M.
Semiconductor R&d Center Samsung Electronics Co Ltd.
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Shin D.
Semiconductor R&d Center Samsung Electronics Co.
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Kim K.
Semiconductor R&d Center Samsung Electronics Co.
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Lee S.
Semiconductor Advanced Research Div. Hyundai Electronics Industries Co.
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LEE J.
Semiconductor Advanced Research Div., HYUNDAI Electronics Industries Co.
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Lee J.
Semiconductor R&d Center Samsung Electronics Co.
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Lee S.
Semiconductor R&d Center Samsung Electronics Co.
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Lee M.
Semiconductor R&d Center Samsung Electronics Co.
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HWANG Y.
Semiconductor R&D Center, Samsung Electronics Co.
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KOO B.
Semiconductor R&D Center, Samsung Electronics Co.
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JUNG D.
Semiconductor R&D Center, Samsung Electronics Co.
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SHIN S.
Semiconductor R&D Center, Samsung Electronics Co.
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CHUN Y.
Semiconductor R&D Center, Samsung Electronics Co.
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Shin S.
Semiconductor R&d Center Samsung Electronics Co.
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Lee J.
Semiconductor Advanced Research Div. Hyundai Electronics Industries Co.
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Koo B.
Semiconductor R&d Center Samsung Electronics Co.
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JUNG D.
Semiconductor R&D Center, Samsung Electronics Co.
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- THE INFLUENCE OF INTEGRATION PROCESS ON THE IMPRINT IN PT-PZT-PT FERROELECTRIC CAPACITORS