Optimization of Process Conditions for Quarter Micron Recessed Poly-Si Spacer LOCOS (RPSL) Isolation
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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KIM S.
Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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Lee M.
Semiconductor R&d Center Samsung Electronics Co Ltd.
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Lee M.
Semiconductor Research Center Samsung Electronics Co. Ltd.
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Hong S.
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Ahn D.
Semiconductor R & D Lab. Hyundai Electronics Industries Co. Ltd.
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KANG H.
Semiconductor R&D Center, Samsung Electronics Co., LTD
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PARK T.
Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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SHIN Y.
Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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Kim S.
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kang H.
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kang H.
Semiconductor Research Center Samsung Electronics Co. Ltd.
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Hong S.
Semiconductor Research Center Samsung Electronics Co. Ltd.
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Kim S.
Semiconductor Research Center Samsung Electronics Co. Ltd.
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