Dry Etching of TaN/HfO_2 Gate Stack Structure by Cl_2/SF_6/Ar Inductively Coupled Plasma
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-30
著者
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Shin Myoung
Department Of Materials Engineering And Center For Advanced Plasma Surface Technolog Sungkyunkwan Un
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Ahn Jinho
School Of Materials Science And Engineering Hanyang University
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Lee Taeho
School Of Materials Science And Engineering Hanyang University
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Kim Jiyoung
Department Of Radiation Oncology : Brain Korea 21 Project For Medical Science Yonsei University Medi
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OH Tae
Department of Nano Science and Technology, Sungkyunkwan University
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NA Sung-Woong
Department of Materials Engineering and Center for Advanced Plasma Surface Technolog, Sungkyunkwan U
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LEE Nae-Eung
Department of Materials Engineering and Center for Advanced Plasma Surface Technolog, Sungkyunkwan U
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Oh Tae
Department Of New Materials Engineering Kookmin University
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