Spatial Energy Distributions of Sputtered Atoms and Reflected Particles during Kr^+ and Ar^+ Ion Beam Sputtering of Si and Ge

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-12-15

著者

• LEE Nae-Eung

  Department of Materials Engineering and Center for Advanced Plasma Surface Technolog, Sungkyunkwan U

• Lee N‐e

  Sungkyunkwan Univ. Kyunggi‐do Kor

• Lee Nae-eung

  Department Of Materials Engineering And Center For Advanced Plasma Surface Technolog Sungkyunkwan Un

関連論文

• Dry Etching of TaN/HfO_2 Gate Stack Structure by Cl_2/SF_6/Ar Inductively Coupled Plasma
• ArF Photoresist Deformation in Dual Frequency Superimposed Capacitively Coupled Plasma (DFS-CCP) with Different Frequency Combinations
• Spatial Energy Distributions of Sputtered Atoms and Reflected Particles during Kr^+ and Ar^+ Ion Beam Sputtering of Si and Ge
• Formation of Nickel Silicide Layer on Strained-Si_Ge_/Si(001) using a Sacrificial Si Layer and its Morphological Instability
• Dry Etching of TaN/HfO2 Gate Stack Structure by Cl2/SF6/Ar Inductively Coupled Plasma
• ArF Photoresist Deformation in Dual Frequency Superimposed Capacitively Coupled Plasma (DFS-CCP) with Different Frequency Combinations
• Formation and Properties of Epitaxial CoSi2 Layers on p-Si0.83Ge0.17/p-Si(001) using a Si Capping Layer by Metal-Organic Chemical Vapor Deposition
• Formation of Nickel Silicide Layer on Strained-Si0.83Ge0.17/Si(001) using a Sacrificial Si Layer and its Morphological Instability

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