ArF Photoresist Deformation in Dual Frequency Superimposed Capacitively Coupled Plasma (DFS-CCP) with Different Frequency Combinations
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-30
著者
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CHO SU
Department of Pediatrics, Ewha Womans University College of Medicine
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LEE Nae-Eung
Department of Materials Engineering and Center for Advanced Plasma Surface Technolog, Sungkyunkwan U
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Cho Su
Department Of Materials Engineering And Center For Advanced Plasma Surface Technology Sungkyunkwan U
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Kim Duck
Department Of Mechanical Design Engineering Chungnam National University
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KWON Ki
Jusung Engineering
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