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Samsung Electronics Co. Ltd. Kyungki‐do Kor | 論文
- A Compact-Disc-Compatible Digital Versatile Disc Pickup Using Annular Mask
- Integration of Hydrogen Silsesquioxane(HSQ) as an Intermetal Dielectric(IMD)Material for 0.35_ Technology
- Integration of Hydrogen Silsesquioxane (HSQ) as an Intermetal Dielectric (IMD) Material for 0.35μm Technology
- Blu-ray Disc Pickup Head for Dual Layer
- High Response Twin-Objective Actuator with Radial Tilt Function for Blu-ray Disc Recorder
- A Compact Disc-Recordable Compatible Digital Versatile Disc Pickup with a Lens for 780nm and 650nm Wavelengths
- A Study on the Germano-Silicide Formation in the Ni/Si_Ge_x System for CMOS Device Applications
- Effects of Encapsulating Barrier Layer on Ferroelectric Properties of Ir/IrO_2/PZT/Pt/IrO_2 Capacitor
- Preparation and Electrical Properties of SrTiO3 Thin Films Deposited by Liquid Source Metal-Organic Chemical Vapor Deposition (MOCVD)
- Deposition and Electrical Characterization of Very Thin SrTiO_3 Films for Ultra Large Scale Integrated Dynamic Random Access Memory Application
- Electrical Characterizations of Pt/(Ba,Sr)TiO_3/Pt Planar Capacitors for ULSI DRAM Applications
- Low Dark Current and High-Speed Metal-Semiconductor-Metal Photodetector on Sulfur-Treated InP
- Three-Element Objective Lens with Numerical Aperture of 0.85
- Scanning Rapid Thermal Annealing Process for Poly Silicon Thin Film Transistor
- W-Plug Common Contact with CoSi_2 Ohmic Layer for Scaled DRAM and Merged DRAM in Logic (MDL) Devices
- Application of PECVD-WNx Electrode for Ta_2O_5 Capacitor
- Application of PECVD-WNx Electrode for Ta_2O_5 Capacitor
- Degradation and Recovery in the Ferroelectric Properties of Pt/Pb(Zr,Ti)O_3/Pt capacitor caused by SiO_2 Film Deposition
- Degradation and Recovery in the Ferroelectric Properties of Pt/Pb(Zr,Ti)O_3/Pt capacitor caused by SiO_2 Film Deposition
- Structural and Electrical Properties of Ba_Sr_TiO_3 Films on Ir and IrO_2 Electrodes