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Samsung Advanced Institute Of Technology (sait) | 論文
- Development of a 500-GHz Band SIS Mixer
- Parallel Connected Twin SIS Junctions for Millimeter and Submillimeter Wave Mixers : Analysis and Experimental Verification
- Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition (
- Chaotic UWB Communication System for Low-Rate Wireless Connectivity Applications(Wireless Communication Technologies)
- Excimer Laser Annealing of PbZr_Ti_O_3 Thin Film at Low Temperature(Electronic Materials)
- Excimer Laser Annealing of PbZr0.4 Ti0.6O3 Thin Film at Low Temperature for TFT FeRAM Application (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- Excimer Laser Annealing of PbZr0.4 Ti0.6O3 Thin Film at Low Temperature for TFT FeRAM Application (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- Optimization of Postannealing Process for Low Temperature MOCVD (Ba, Sr)TiO_3 Thin Films
- Iterative Transmit/Receive Antenna Selection in MIMO Systems Based on Channel Capacity Analysis
- Adaptive Clustering Technique Using Genetic Algorithms(Data Mining)
- Priority and Negotiation Based Dynamic Spectrum Allocation Scheme for Multiple Radio Access Network Operators
- High-electrochemical performance of a highly dispersed nanoporous nanocomposite Ni-YSZ
- High-K/Metal Gate MOSFETs における新しいレイアウト依存性
- A New Approach of Polycrystalline Silicon Film on Plastic Substrate Prepared by Ion Beam Deposition Followed by Excimer Laser Crystallization at Room Temperature
- Tensile-Strained Single-Crystal Si Film on Insulator by Epitaxially Seeded and Laser-Induced Lateral Crystallization
- Low-Temperature Process for Advanced Si Thin Film Transistor Technology
- Erratum: "Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition ($
- Oxygen Effect on Laser Crystallization of Sputtered a-Si Film on Plastic Substrate