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Ntt Basic Research Laboratories | 論文
- Line-Edge Roughness: Characterization and Material Origin
- Separation by Bonding Si Islands (SBSI) for Advanced CMOS LSI Applications(Si Devices and Processes, Fundamental and Application of Advanced Semiconductor Devices)
- Step-Free GaN Hexagons Grown by Selective-Area Metalorganic Vapor Phase Epitaxy
- Formation of Solid Solution of Al_Si_xN (0
- Carbon in III-V Compounds: A Theoretical Approach
- Turnstile Operation Using a Silicon Dual-Gate Single-Electron Transistor
- Mechanism of Potential Profile Formation in Silicon Single-Electron Transistors Fabricated Using Pattern-Dependent Oxidation : Semiconductors
- Single-Electron Transistor and Current-Switching Device Fabricated by Vertical Pattern-Dependent Oxidation
- Effect of Oxidation-Induced Strain on Potential Profile in Si SETs Using Pattern-Dependent Oxidation (PADOX)
- Fabrication of SiO_2/Si/SiO_2 Double Barrier Diodes using Two-Dimensional Si Structures
- Electron Tunneling from a Quantum Wire Formed at the Edge of a SIMOX-Si Layer
- Energy Eigenvalues and Quantized Conductance Values of Electrons in Si Quantum Wires on {100} Plane
- Novel Fabrication Technique for a Si Single-Electron Transistor and Its High Temperature Operation
- Increase in Switching Charge of Ferroelectric SrBi_2Ta_2O_9 Thin Films with Polarization Reversal
- Preparation and Electrical Properties of PZT Thin Film Capacitors for Ferroelectric Random Access Memory
- Conspicuous Voltage Shift of D-E Hysteresis Loop and Asymmetric Depolarization in Pb-Based Ferroelectric Thin Films
- Preparation of La-Modified Lead Titanate Film Capacitors and Influence of SrRuO_3 Electrodes on the Electrical Properties
- Characterization of Niobium-Doped Lead Titanate Thin Films
- Electrical Properties of LiNbO_3 Thin Films by RF Magnetron Sputtering and Bias Sputtering
- Preparation and Optical Waveguide Properties of LiNbO_3 Thin Films by IF Magnetron Sputtering