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Musashi Works Hitachi Ltd. | 論文
- Stitching Error Analysis in an Electron Beam Lithography System: Column Vibration Effect
- The Requirements for Future Elcetron-Beam Reticle Fabrication Systems from an Error Analysis Viewpoint
- Error Analysis in Electron Beam Lithography System : Thermal Effects on Positioning Accuracy
- Measurement of Thermal Radiative Properties of Silicon Wafers with Oxide Film and Nitride Film at 950℃
- A Defect Control Technique for the Intrinsic Gettering in Silicon Device Processing
- Infrared Lattice Vibration Spectra of Crystalline Quartz
- Effects of Various Doping Elements on the Transition Temperature of Vanadium Oxide Semiconductors
- Fast Etching Phenomenon of Plasma-Silicon Nitride Films over Substrate Steps
- Formation of a Stacking Fault-Free Region in Thermally Oxidized Silicon
- Reststrahl Reflection Characteristics of Amorphous Silica
- Contribution of Surface Electrons to the Infrared Optical Properties of Silicon
- Improvement of Written-State Retentivity by Scaling Down MNOS Memory Devices : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)
- Enhanced Growth of Thermal Oxide Due to Impurity Absorption from Adjoining Contaminated Silicon Wafers
- A New Type Semiconductor (Critical Temperature Resistor)