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Functional Devices Research Laboratories NEC Corporation | 論文
- Chemical Vapor Deposition of Amorphous Silicon Using Tetrasilane
- Characterization of Chemical-Vapor-Deposited Amorphous-Silicon Films
- Low-Temperature Chemical Vapor Deposition of Silicon Nitride Using A New Source Gas : Hydrogen Azide
- Hot-Wall Chemical-Vapor-Deposition of Amorphous-Silicon and Its Application to Thin-Film Transistors
- The Effects of Hot Ion-Implantation on the Electrical Properties of Amorphous-Silicon Films Produced by Chemical-Vapor-Deposition Method
- Chemical Vapour Deposition of Amorphous Silicon with Silanes for Thin Film Transistors : The Influence of the Amorphous Silicon Deposition Temperature
- Top-Gate Amorphous-Silicon Thin-Film Transistors Produced by CVD Method
- Hydrogen-Radical Annealing of Chemical Vapor-Deposited Amorphous Silicon Films
- Optimization of Chemical Vapor Deposition Conditions of Amorphous-Silicon Films for Thin-Film Transistor Application
- Amorphous-Silicon Thin-Film Transistors Using Chemical Vapor Deposition of Disilane
- Amorphous-Silicon Thin-Film Transistors with Silicon Dioxide Gate Grown in Nitric-Acid Gas
- Normal-Pressure and Low-Temperature Thermal Oxidation of Silicon
- LCD Legibility as a Function of Resolution (Special Issue on Electronic Displays)
- Repetitive Track Seeking Algorithm for Optical Disk Drives
- Chromium Fluoride Attenuated Phase-Shifting Mask for Argon Fluoride Excimer Laser Lithography
- Giant Magnetic Field Effect on Thermal Conductivity of Magnetic Multilayers, Cu/Co/Cu/Ni(Fe)
- Multi-Beam Optical Disk Drive for High Data Transfer Rate Systems : Drive Technology
- Multi-Beam Optical Disk Drive for High Data Transfer Rate Systems
- Monolithic Eight-Channel High-Power Low-Astigmatism AlGaAs Laser Diode Array
- ArF Chemically Amplffied Positive Resist Based on Alicyclic Lactone Polymer : Instrumentation, Measurement, and Fabrication Technology