スポンサーリンク
Department of Electronics and Information Engineering, Chubu University | 論文
- Fine adhesion patterning and aligned nuclei orientation of mesenchymal stem cell on narrow line-width of silicone rubber implanted by carbon negative ions (第50回真空に関する連合講演会プロシーディングス)
- Monte Carlo Simulation of Emission Efficiency of Cone-shaped Metal-Insulator-Semiconductor Cathode
- Stability of Field Emission Current from Boron-Doped Diamond Thin Films Terminated with Hydrogen and Oxygen
- Influences of Ambient Gases on the Emission Characteristics of Nickel-Deposited Field Emitters for Vacuum Microelectronics
- Relationship between Effective Work Functions and Noise Powers of Emission Currents in Nickel-Deposited Field Emitters
- Estimation of Metal-Deposited Field Emitters for the Micro Vacuum Tube
- Formation and Control of Stoichiometric Hafnium Nitride Thin Films by Direct Sputtering of Hafnium Nitride Target
- Yield Measurement of Secondary Electrons Emitted from Silicon Dioxide Film in Negative-Ion Bombardment
- Liquid Gold-Antimony Ion Sources
- Self-Aligned Fabrication of Extractor for Cone-Shaped Metal-Insulator-Semiconductor Electron Tunneling Cathodes
- Plasma Electron Energy Distribution of a Beam-Plasma Type Ion Source
- Energy Distribution and Yield Measurement of Secondary Electrons to Evaluate the Equilibrium Charging Voltage of an Isolated Electrode during Negative-Ion Implantation
- Fabrication of Cone-Shaped Metal-Insulator-Semiconductor Electron Tunneling Cathode
- Application of Focused Ion Beam Techniques to the Fabrication of Lateral-Type Thin-Film Edge Field Emitters
- Beam-Plasma Type Metal Ion Source
- Silver Negative-Ion Implantation into Thermally Grown Thin SiO2 Film on Si Substrate and Heat Treatment for Formation of Silver Nanoparticles
- Formation and Control of Stoichiometric Hafnium Nitride Thin Films by Direct Sputtering of Hafnium Nitride Target
- Yield Measurement of Secondary Electrons Emitted from Silicon Dioxide Film in Negative-Ion Bombardment
- Plasma Effects on Electrostatic Chuck Characteristics on Capacitive RF Discharge